Thanks for the link. What I'm wondering is how this guy aims to succeed where previous X-ray lithography efforts failed. For reference X-ray litho was competing with EUV. What was it that held the approach back? My guess would be that that the industry simply coalesced around EUV and X-rays were abandoned. But that just makes me wonder why the industry coalesced there. Perhaps synchrotons are not cheap / easy? But don't university labs build these all the time?

Prof. Hank Smith of MIT spent decades trying to push X-ray lithography but yes, the industry coalesced around DUV and then EUV.

https://dspace.mit.edu/bitstream/handle/1721.1/16801/5050370...

As far as I understand it real X-Rays are too hard to handle in general, and though more precise because of shorter wavelengths etch too much away from the substrates. EUV is just soft enough, to not do that(as much). That seems to be the main reason all the effort went into EUV of 'just the right wavelength and energy.'

That searchforthenext link shows an illustration captioned "Conventional CMOS unipolar NOR gate."

It's actually a NAND gate. Seems like a pretty big red flag if they want to revolutionize transistors but they can't even get super basic stuff right.